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Global Lithography Metrology Equipment Market to Reach $681.4 Million by 2026

 
2022
Global Lithography Metrology Equipment Market

Report Code : A03808

quote The global lithography metrology equipment market size is expected to witness considerable growth, due to emergence of internet of things (IoT) in semiconductor manufacturing and fabrication process. The lithography metrology equipment industry is projected to witness significant growth, especially in the emerging economies such as Asia-Pacific and LAMEA, owing to the development of semiconductor industry in the regions. quote

Divyanshi Tewari
Lead Analyst, Semiconductors & Electronics at Allied Market Research

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According to a recent report published by Allied Market Research, titled,Lithography Metrology Equipment Market by Technology, Product, Connectivity, and Application: Global Opportunity Analysis and Industry Forecast, 2018-2026," the global market was valued at $382.6 million in 2018, and is projected to reach $681.4 million by 2026, registering a CAGR of 7.2% from 2019 to 2026.

Metrology and inspection are important for the measurement of the semiconductor manufacturing process. This process is established at critical point of semiconductor manufacturing process to ensure accurate yield. Lithography metrology equipment are used for various factors such as critical dimension measurement, imaging of wafer patterns using photoresist, defect analysis, pattern process development, and material screening. A major restraint, which affects the lithography metrology market is rapid advancement of patterning technology, which increases its overall cost.

A critical dimension scanning electron microscope (CD-SEM) is a dedicated system for measuring the dimensions of the fine patterns formed on a semiconductor wafer. CD-SEM is mainly used in the manufacturing lines of electronic devices of semiconductors. A scanning electron microscope, or SEM, takes measurements by sending out an electron beam, which interacts with electrons in the material being scanned. This sends back signals, which are mapped by the equipment. The more critical dimensions that need to be mapped, the greater the amount of data that needs to be processed and stored.

Critical dimension scanning electron microscope has certain limitations in lithography metrology equipment market. This technology is capable of measuring traditional mast shapes, but it experiences certain hindrances during the metrology of complex patterns and shapes on the semiconductor mask or wafers. In addition, CD-SEM files are measured in tens or hundreds of gigabytes, which requires large data that makes the metrology process complex and stringent as large quantity of data cannot be processed within a reasonable time frame.

Asia-Pacific has a considerable share in the lithography metrology equipment market growth and is expected to be the fastest growing regional segment in the near future, with the highest CAGR. With an increase in demand for high voltage operating devices, organizations across verticals are realizing the importance of driver IC to ensure power management. High demand for automated switching devices and power modules is expected to be the key trend that is anticipated to influence the lithography metrology equipment market growth. In addition, emerging countries such as India, Philippines, and others are expected to offer lucrative opportunities for the growth of the market. According to lithography metrology equipment market trends, India has a very fast-growing electronics system design manufacturing (ESDM) industry. India also has a strong design base with more than 120 units. According to the Department of Electronics and Information Technology (DEITY), nearly 2,000 chips are being designed every year in India and more than 20,000 engineers are working on various aspects of chip design and verification.

China is highly dependent on foreign technology in its semiconductor industry, importing 90% of its chips to power its fast-growing economy. According to the Wall Street Journal, China is close to finalizing a $47 billion investment fund that would finance semiconductor research and chip startup development, which is expected to propel the growth of the market. China has the presence of some major manufacturing and fabrication plants such as ASMC, Beilling, Huahong Grace, TI, and others, which creates lucrative lithography metrology equipment market opportunity. 

Key Finding of The Lithography Metrology Equipment Market:

  • Based on technology, the CD-SEM segment generated the highest revenue in the global lithography metrology equipment market in 2018.
  • Based on industry, the chemical control equipment segment generated the highest revenue in the lithography metrology equipment market share in 2018.
  • Based on application, the quality control and inspection segment generated the highest revenue in the lithography metrology equipment market forecast in 2018.

The key players profiled in the lithography metrology equipment market analysis include Hitachi High Technologies Corporation, ASML, Advantest Corporation, KLA-Corporation, NOVA, Nanometrics, Mikon Metrology NV, Canon Inc., Tokyo Electron Limited, and Applied Materials Inc. These key players adopt several strategies such as, new product launch and development, acquisition, partnership and collaboration and business expansion to increase the lithography metrology equipment market share during the forecast period.

 

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quote Lithography Metrology Equipment Market by Technology (CD-SEM, OCD, Overlay Control, and Others), Product (Chemical Control Equipment, Gas Control Equipment, and Others), Application (Quality Control & Inspection, Reverse Engineering, Virtual Simulation, and Others): Global Opportunity Analysis and Industry Forecast, 2019–2026 quote

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